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Nickel sulfide (NiS2)

1. Purity:

4N(99.99%)

2. Anlysis:

ICP-MS(All impurity elements is below 100ppm); XRD;

3. Process:

CVD chemical vapor deposition

Ni(arc heating) + S(excess) → NiS2, then sulfur removal

4. Packing:

1Kg/bottle + Vacuum packing

5. Particle Size:

Powder

6. Application:

as semiconductor material

7. Service:

Supply MSDS, COA